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doi.org/10.1016/j.vacuum.2018.01.011
Cu films prepared by bipolar pulsed high power impulse magnetron sputtering
Baohua Wu
31
,
Ian Haehnlein
4
,
...,
D. N. Ruzic
36
View all 9 authors
Vacuum
3.90
Volume: 150, Pages: 216 - 221
Published
: Jan 8, 2018
97
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Paper Fields
Physics
Cavity magnetron
Nanotechnology
High-power impulse magnetron sputtering
Wafer
Thin film
Materials science
Sputtering
Sputter deposition
Quantum mechanics
Optoelectronics
Impulse (physics)
Paper Details
Title
Cu films prepared by bipolar pulsed high power impulse magnetron sputtering
DOI
doi.org/10.1016/j.vacuum.2018.01.011
Published Date
Jan 8, 2018
Journal
Vacuum
Volume
150
Pages
216 - 221
Notes
History
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