Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering
Abstract
Tungsten sub-nitride thin films deposited on silicon samples by reactive magnetron sputtering were used as a model system to study the phase stability and microstructural evolution during thermal treatments. XRD, SEM&FIB, XPS, RBS and TDS were applied to investigate the stability of tungsten nitride films after heating up to 1473 K in vacuum. At the given experimental parameters a 920 nm thick crystalline film with a tungsten and nitrogen...
Paper Details
Title
Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering
Published Date
Mar 1, 2017
Journal
Volume
485
Pages
1 - 7
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