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Original paper

Large-Area Low-Cost Plasmonic Perfect Absorber Chemical Sensor Fabricated by Laser Interference Lithography

Volume: 1, Issue: 9, Pages: 1148 - 1154
Published: Aug 24, 2016
Abstract
We employ laser interference lithography as a reliable and low-cost fabrication method to create nanowire and nanosquare arrays in photopolymers for manufacturing plasmonic perfect absorber sensors over homogeneous areas as large as 5.7 cm2. Subsequently, we transfer the fabricated patterns into a palladium layer by using argon ion beam etching. Geometry and periodicity of our large-area metallic nanostructures are precisely controlled by...
Paper Details
Title
Large-Area Low-Cost Plasmonic Perfect Absorber Chemical Sensor Fabricated by Laser Interference Lithography
Published Date
Aug 24, 2016
Volume
1
Issue
9
Pages
1148 - 1154
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