Original paper

Surface etching, chemical modification and characterization of silicon nitride and silicon oxide—selective functionalization of Si3N4and SiO2

Volume: 28, Issue: 9, Pages: 094014 - 094014
Published: Feb 12, 2016
Abstract
The ability to selectively chemically functionalize silicon nitride (Si3N4) or silicon dioxide (SiO2) surfaces after cleaning would open interesting technological applications. In order to achieve this goal, the chemical composition of surfaces needs to be carefully characterized so that target chemical reactions can proceed on only one surface at a time. While wet-chemically cleaned silicon dioxide surfaces have been shown to be terminated with...
Paper Details
Title
Surface etching, chemical modification and characterization of silicon nitride and silicon oxide—selective functionalization of Si3N4and SiO2
Published Date
Feb 12, 2016
Volume
28
Issue
9
Pages
094014 - 094014
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