The structure and toughness of TiN coatings prepared by modulated pulsed power magnetron sputtering

Titanium nitride (TiN) coatings were prepared on different substrates (Si wafer, M2 steel, glass) by modulated pulsed power (MPP) sputtering and continuous dc magnetron sputtering (dcMS). The structure and properties were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), nanoindentation and the Vickers indentation test. It was found that the structure was transformed from the columnar growth to the branched growth...