Physics

Nanotechnology

Electron temperature

High-power impulse magnetron sputtering

Analytical Chemistry (journal)

Voltage

Langmuir probe

Atomic physics

Chemistry

Thin film

Materials science

Sputtering

Sputter deposition

Quantum mechanics

Plasma

Pulsed power

Plasma diagnostics

Chromatography

Argon

Impulse (physics)

Applied Physics Letters

High power impulse magnetron sputtering (HiPIMS) of a cobalt cathode in argon gas was investigated by time-resolved electrical (Langmuir) probe diagnostics and by time-integrated energy-resolved mass spectrometry. The HiPIMS discharge was operated with a bipolar pulsed power supply, providing a large negative voltage with a typical pulse width of 100 μs followed by a long positive pulse with a pulse width of about 310 μs. The time-resolved Langmuir probe results yield a small negative plasma potential in the negative pulse regime and a large positive floating potential and plasma potential in the positive pulse regime. The electron density is significantly reduced during the positive pulse regime. The probe results are supported by ion energy measurements.

Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge