Erratum: ‘‘Dissociation kinetics of hydrogen‐passivated (100)Si/SiO<sub>2</sub> interface defects’’ [J. Appl. Phys. <b>77</b>, 6205 (1995)]

Erratum: ‘‘Dissociation kinetics of hydrogen‐passivated (100)Si/SiO₂ interface defects’’ [J. Appl. Phys. 77, 6205 (1995)]

Volume: 78, Issue: 8, Pages: 5215 - 5215

Published: Oct 15, 1995

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Title

Erratum: ‘‘Dissociation kinetics of hydrogen‐passivated (100)Si/SiO₂ interface defects’’ [J. Appl. Phys. 77, 6205 (1995)]

DOI

Published Date

Oct 15, 1995

Journal

Volume

78

Issue

8

Pages

5215 - 5215

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