doi.org/10.1016/j.apsusc.2022.154050

Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide

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..., Geun Young Yeom

Applied Surface Science6.90

Volume: 600, Pages: 154050 - 154050

Published: Jun 27, 2022

Paper Fields

Paper Details

Title

Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide

DOI

doi.org/10.1016/j.apsusc.2022.154050

Published Date

Jun 27, 2022

Journal

Applied Surface Science

Volume

600

Pages

154050 - 154050

Notes

History