Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies

In this study, various diagnostic tools were constructed and plasma factors measured to evaluate the intelligence of plasma process equipment. We used an ICP (Inductively Coupled Plasma) reactor with a radio frequency (RF) power of 13.56 MHz, a power of 400 to 800 W, and a pressure of 10 to 30 mTorr. Plasma parameters such as electron density (ne), electron temperature (Te), plasma potential (Vp), and floating potential (Vf) were measured using...