Original paper
Roughness measurement of 2D curvilinear patterns: challenges and advanced methodology
Published: Feb 22, 2021
Abstract
2D curvilinear patterns are more and more present in the lithography landscape. For the related devices, the line edge roughness (LER) is, as well as for lines and spaces, a critical figure of merit. In this article we propose to use a dedicated edge detection algorithm to measure LER of 2D curvilinear patterns on CD-SEM images. We present an original method to validate the algorithm, in the context of roughness measurement. It is based on the...
Paper Details
Title
Roughness measurement of 2D curvilinear patterns: challenges and advanced methodology
Published Date
Feb 22, 2021
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