Effects of Ethylene/Ammonia Mixtures on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

When ethylene/ammonia (C2H4/NH3) mixtures are used to deposit carbon films by thermal chemical vapor deposition (CVD), effects of C2H4/(C2H4+NH3) ratios on the deposition rate and microstructures of carbon films are investigated. Experimental results reveal that the deposition rate of carbon films increases with the C2H4/(C2H4+NH3) ratio, and also, raises with the residence time, deposition temperature, and working pressure. The kinetics of this...