Vertically aligned carbon nanotubes grown by plasma enhanced chemical vapor deposition

Volume: 21, Issue: 6, Pages: 2564 - 2568
Published: Nov 1, 2003
Abstract
Plasma enhanced chemical vapor deposition, which enables growth of carbon nanotubes directly onto substrates, is potentially suitable for preparing carbon nanotubes as electron sources in field emission displays. In this article, we report the growth of aligned carbon nanotubes by microwave plasma enhanced chemical vapor deposition and investigate the effect of various parameters on the growth. Comparison among three catalysts (Fe, Co, and Ni)...
Paper Details
Title
Vertically aligned carbon nanotubes grown by plasma enhanced chemical vapor deposition
Published Date
Nov 1, 2003
Volume
21
Issue
6
Pages
2564 - 2568
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