S. Dhounsi
Jawaharlal Nehru University
Analytical chemistryNanocrystalline materialEvaporation (deposition)Surface diffusionThin filmMaterials scienceTin oxideSubstrate (electronics)Ion beamGrain growth
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#1Tanuja Mohanty (JNU: Jawaharlal Nehru University)H-Index: 17
#2S. Dhounsi (JNU: Jawaharlal Nehru University)H-Index: 1
Last. D. KanjilalH-Index: 27
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Abstract Nanocrystalline tin oxide (SnO 2 ) thin films of 200 nm thickness were deposited on quartz and sapphire substrates by e-beam evaporation method. The substrate temperature was kept at 200 °C to enhance the surface diffusion of the atoms. The films were characterized by atomic force microscopy (AFM), glancing angle X-ray diffraction (GAXRD) and UV-visible spectroscopy for morphological, structural and optical characterization respectively. The nanocrystalline grains are found to be 4 ± 2 ...
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