Ultrathin Cobalt Oxide Interlayer Facilitated Hole Storage for Sustained Water Oxidation over Composited Tantalum Nitride Photoanodes

Volume: 11, Issue: 20, Pages: 12736 - 12744
Published: Oct 5, 2021
Abstract
The hole-storage layer (HSL) strategy has been demonstrated as an efficient interfacial modification method to overcome the instability of tantalum nitride (Ta3N5) photoanodes and further boost high performance in photoelectrochemical (PEC) water oxidation reaction. Herein, we report that the CoOx/Ni(OH)x bilayer as a typical HSL could effectively extract and store photogenerated holes from Ta3N5, resulting in a decent photocurrent enhancement...
Paper Details
Title
Ultrathin Cobalt Oxide Interlayer Facilitated Hole Storage for Sustained Water Oxidation over Composited Tantalum Nitride Photoanodes
Published Date
Oct 5, 2021
Volume
11
Issue
20
Pages
12736 - 12744
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