Quantum mechanics

Catalysis

Titanium nitride

Engineering

Oxide

Metallurgy

Materials science

Coating

Layer (electronics)

Glow discharge

Plasma

Tin oxide

Biochemistry

Titanium

Chemical engineering

Cathodic arc deposition

Anatase

Physical chemistry

Cathodic protection

Rutile

Physics

X-ray photoelectron spectroscopy

Surface modification

Composite material

Chemistry

Electrode

Anode

Nitride

Photocatalysis

Physical vapor deposition

Journal of Physics Conference Series

Titanium-based vacuum coatings, such as TiN and TiO 2 , are being widely used for functionalization of the surfaces and for forming protective surface layers for a number of applications. In this study, TiN/TiO 2 coatings were deposited by two physical vacuum deposition (PVD) methods: cathodic-arc (for TiN) and glow-discharge (for TiO 2 ) deposition. We studied the bilayer film composition, structure and properties by means of X-ray diffraction (XRD) analysis, X-ray photoelectron spectroscopy (XPS), and scratch test analysis. The XRD spectrum indicated the presence of both anatase and rutile TiO 2 phases, together with TiN reflections. The Ti 2p, O 1s and N 1s core level of XPS spectra in the depth of the oxide up to the oxide-nitride interface indicated intimate heterojunction between the layers. This results in a lower coefficient of friction and improved adhesion strength of the TiN/TiO 2 film compared with pristine TiN coating.

Composition, structure and adhesion of cathodic-arc and glow-discharge deposited TiN/TiO<sub>2</sub> coatings: a case study

Composition, structure and adhesion of cathodic-arc and glow-discharge deposited TiN/TiO2 coatings: a case study

Composition, structure and adhesion of cathodic-arc and glow-discharge deposited TiN/TiO₂ coatings: a case study