Quantum mechanics

Sediment

Engineering

Biology

Metallurgy

Materials science

Cathode

Deposition (geology)

Plasma

Cadmium sulfide

Chemical engineering

Substrate (aquarium)

Geology

Oceanography

Physical chemistry

Paleontology

Physics

Plasma processing

Plasma cleaning

Chemistry

Optoelectronics

We describe a hollow cathode plasma formed within a heated pocket deposition (HPD) source covered with a transparent conductive oxide (TCO)-coated substrate. Super-hydrophilic behavior and little change in TCO transmission of TCO substrates exposed to the plasma are observed. The “plasma cleaner” source was placed in-line with the CSU advanced deposition system (ARDS), and CdS and CdTe films were deposited on both plasma and conventionally cleaned substrates. Plasma-cleaned substrates result in improved cadmium sulfide films without pinholes after plasma exposure times as short as 5 sec. Cells formed with plasma cleaned substrates display improved V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OC</sub> , fill factor, and efficiency.

Plasma cleaning of TCO surfaces prior to CdS/CdTe deposition