Physics

Nanotechnology

Electrode

Organic chemistry

Coating

Physical vapor deposition

Deposition (geology)

Electron beam physical vapor deposition

Biology

Electric arc

Ion plating

Physical chemistry

Paleontology

Atomic physics

Vaporization

Chemistry

Thin film

Materials science

Ionization

Cathodic protection

Sputtering

Sediment

Sputter deposition

Quantum mechanics

Plasma

Electrochemistry

Evaporation

Cathodic arc deposition

Thermodynamics

Plasma Sources Science and Technology

Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by physical means, followed by deposition of those atoms on a nearby surface to form a thin film or coating. Various approaches and techniques are applied to release the atoms including thermal evaporation, electron beam evaporation, ion-driven sputtering, laser ablation, and cathodic arc-based emission. Some of the approaches are based on a plasma discharge, while in other cases the atoms composing the vapor are ionized either due to the release of the film-forming species or they are ionized intentionally afterward. Here, a brief overview of the various PVD techniques is given, while the emphasis is on sputtering, which is dominated by magnetron sputtering, the most widely used technique for deposition of both metallic and compound thin films. The advantages and drawbacks of the various techniques are discussed and compared.

Foundations of physical vapor deposition with plasma assistance