Consideration of contribution of hot-electron injection to the resistive switching of sputter-deposited silicon oxide film

Volume: 24, Issue: 3, Pages: 1367 - 1378
Published: Dec 1, 2021
Abstract
This paper considers the contribution of hot electrons to the resistive switching of sputter-deposited silicon oxide films based on experiments together with semi-2D Monte Carlo simulations.  Using various device stack structures, this paper examines the impact of hot-electron injection on resistive switching, where conduction-band offset and Fermi-level difference are utilized.  Support is found for the predictions that hot-electron injection...
Paper Details
Title
Consideration of contribution of hot-electron injection to the resistive switching of sputter-deposited silicon oxide film
Published Date
Dec 1, 2021
Volume
24
Issue
3
Pages
1367 - 1378
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