Thermal Stability of Grain Structure for Ag Nanotwinned Films Sputtered with Substrate Bias

Published on Dec 1, 2021in Materialia
· DOI :10.1016/J.MTLA.2021.101215
Yu-Chang Lai1
Estimated H-index: 1
(NTU: National Taiwan University),
Po-Ching Wu (NTU: National Taiwan University), Tung-Han Chuang26
Estimated H-index: 26
(NTU: National Taiwan University)
Abstract null null In this study, different grain growth paths after aging at various temperatures for 1 hour were observed in Ag nanotwinned thin films with and without substrate bias voltage, which led to large differences in thermal stability. As-deposited Ag nanotwinned thin films with and without substrate bias voltage were characterized by FIB, EBSD, and TEM, which revealed thinner equiaxial fine-grained regions, higher amounts of (111)-oriented grains and denser nanotwin stacking perpendicular to the growth direction of columnar grains in thin films with -150 V substrate bias voltage. Due to the better lattice arrangement and densification of the crystal structure due to substrate bias voltage, the microstructures remained almost unchanged, except for a little equiaxial grain growth, even after aging at 450°C for 1 hour. However, in the Ag nanotwinned thin film without substrate bias voltage, severe abnormal grain growth (AGG) occurred after aging at only 250°C for 1 hour. Better understanding of the differences in thermal stability in nanotwinned thin films is provided in this study, and the findings will be beneficial for experimental design for further applications.
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