Filament-assisted reactive magnetron sputter deposition of VSiN films

Many vapor deposition techniques utilize ion irradiation during growth of transition metal nitride-based films to obtain low porosity and to control nanostructural evolution, phase content, and crystallographic texture. In this study, V1-xSixN films (0.18 ≤ x ≤ 0.30) were deposited by a reactive magnetron sputtering process in which a heated filament was used to enhance growth temperature and ion bombardment. Filament discharge current (0.0 A ≤...