doi.org/10.1016/j.jlumin.2021.117937

Investigation of sidewall damage induced by reactive ion etching on AlGaInP MESA for micro-LED application

Younes Boussadi

,

,

..., Christophe Licitra

Journal of Luminescence3.60

Volume: 234, Pages: 117937 - 117937

Published: Jan 24, 2021

Paper Fields

Paper Details

Title

Investigation of sidewall damage induced by reactive ion etching on AlGaInP MESA for micro-LED application

DOI

doi.org/10.1016/j.jlumin.2021.117937

Published Date

Jan 24, 2021

Journal

Journal of Luminescence

Volume

234

Pages

117937 - 117937

Notes

History