Reactive-ion etching

X-ray photoelectron spectroscopy

Etching (microfabrication)

Engineering

Composite material

Chemical engineering

Oxide

Optoelectronics

Analytical Chemistry (journal)

Nanotechnology

Silver oxide

Layer (electronics)

Transmission electron microscopy

Chemistry

Thin film

Metallurgy

Materials science

Scanning electron microscope

Chromatography

Surface roughness

SN Applied Sciences

In this paper, we report oxidation time effect on highly porous silver oxide nanowires thin films fabricated using ultrasonic spray pyrolysis and oxygen plasma etching method. The NW’s morphological, electrical, and optical properties were investigated under different plasma etching periods and the number of deposition cycles. The increase of plasma etching and oxidation time increases the surface roughness of the Ag NWs until it fused to form a porous thin film of silver oxide. AgNWs based thin films were characterized using X-ray diffraction, scanning electron microscope, transmission electron microscope, X-ray photoemission spectroscopy, and UV–Vis spectroscopy techniques. The obtained results indicate the formation of mixed mesoporous Ag 2 O and AgO NW thin films. The Ag 2 O phase of silver oxide appears after 300 s of oxidation under the same conditions, while the optical transparency of the thin film decreases as plasma etching time increases. The sheet resistance of the final film is influenced by the ...

Optoelectronic properties of highly porous silver oxide thin film