Why SEMI Standard E163 should be followed for the Protection of Extremely Electrostatic-Sensitive Semiconductors and Similar Devices during Manufacturing, Packaging and Handling

Pages: 5 - 19
Published: Aug 28, 2020
Abstract
Research into the damage sustained by the reticles (photomasks) used to print semiconductor devices is summarized. It is explained why ESD prevention alone does not necessarily provide adequate protection for such highly electrostatic-sensitive objects. The standard approach to ESD prevention used in the semiconductor industry is shown to increase the risk of other damage mechanisms than ESD to which reticles are far more sensitive. Insights...
Paper Details
Title
Why SEMI Standard E163 should be followed for the Protection of Extremely Electrostatic-Sensitive Semiconductors and Similar Devices during Manufacturing, Packaging and Handling
Published Date
Aug 28, 2020
Pages
5 - 19
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