Alkaline‐developable and negative‐type photosensitive polyimide with high sensitivity and excellent mechanical properties using photo‐base generator
Abstract
An alkaline developable and negative‐type PSPI with a high sensitivity and excellent mechanical properties based on a poly(amic acid) (PAA) and a photo‐base generator has been developed. The PAA was prepared by the polycondensation of p ‐phenylenediamine (PDA) with an equimolar of 3,3′,4,4′‐biphenyltetracarboxylic dianhydride (BPDA) and 4,4′‐(hexafluoroisopropylidene)diphthalic anhydride (6‐FDA) and converted thermally to the corresponding...
Paper Details
Title
Alkaline‐developable and negative‐type photosensitive polyimide with high sensitivity and excellent mechanical properties using photo‐base generator
Published Date
Aug 16, 2020
Journal
Volume
58
Issue
17
Pages
2366 - 2375
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