Effect of Vacuum Annealing on the Properties of IGZO Thin Films
Volume: 27, Issue: 4, Pages: 175 - 179
Published: Jul 30, 2014
Abstract
IGZO thin films were prepared by radio frequency (RF) magnetron sputtering on glass substrates and then annealed in vacuum for 30 minutes at 100, 200 and 300^{\circ}C/TEX>, respectively. The thickness of films kept at 100 nm by controlling the deposition rate. While the optical transmittance and sheet resistance of as deposited films were 91.9% and 901{\Omega}/{\Box}/TEX>, respectively, the films annealed at...
Paper Details
Title
Effect of Vacuum Annealing on the Properties of IGZO Thin Films
Published Date
Jul 30, 2014
Volume
27
Issue
4
Pages
175 - 179
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