Direct CVD Growth of a Graphene/MoS2 Heterostructure with Interfacial Bonding for Two-Dimensional Electronics

Volume: 32, Issue: 11, Pages: 4544 - 4552
Published: May 6, 2020
Abstract
This article describes a novel method for the direct synthesis of patterned graphene on transition-metal dichalcogenides (TMDs) such as molybdenum disulfide (MoS2) with chemical vapor deposition (CVD) that uses a UV/ozone-treated solid carbon source, 1,2,3,4-tetraphenylnaphthalene (TPN) as the graphene growth precursor. The UV/ozone treatment of the TPN film on the MoS2 layer improves the interfacial adhesion between the TPN and MoS2 layers. The...
Paper Details
Title
Direct CVD Growth of a Graphene/MoS2 Heterostructure with Interfacial Bonding for Two-Dimensional Electronics
Published Date
May 6, 2020
Volume
32
Issue
11
Pages
4544 - 4552
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