Voltage

Nucleation

Computer science

Interconnection

Metal-organic framework

Engineering

Chemical engineering

Oxide

Optoelectronics

Adsorption

Zeolitic imidazolate framework

Nanotechnology

Organic chemistry

Imidazolate

High-κ dielectric

Dielectric

Chemistry

Metallurgy

Materials science

Electrical engineering

Computer network

Capacitor

Nature Communications

The performance of modern chips is strongly related to the multi-layer interconnect structure that interfaces the semiconductor layer with the outside world. The resulting demand to continuously reduce the k-value of the dielectric in these interconnects creates multiple integration challenges and encourages the search for novel materials. Here we report a strategy for the integration of metal-organic frameworks (MOFs) as gap-filling low-k dielectrics in advanced on-chip interconnects. The method relies on the selective conversion of purpose-grown or native metal-oxide films on the metal interconnect lines into MOFs by exposure to organic linker vapor. The proposed strategy is validated for thin films of the zeolitic imidazolate frameworks ZIF-8 and ZIF-67, formed in 2-methylimidazole vapor from ALD ZnO and native CoOx, respectively. Both materials show a Young's modulus and dielectric constant comparable to state-of-the-art porous organosilica dielectrics. Moreover, the fast nucleation and volume expansion a...

Vapor-deposited zeolitic imidazolate frameworks as gap-filling ultra-low-k dielectrics