Conformal hexagonal-boron nitride dielectric interface for tungsten diselenide devices with improved mobility and thermal dissipation

Volume: 10, Issue: 1
Published: Mar 13, 2019
Abstract
Relatively low mobility and thermal conductance create challenges for application of tungsten diselenide (WSe 2 ) in high performance devices. Dielectric interface is of extremely importance for improving carrier transport and heat spreading in a semiconductor device. Here, by near-equilibrium plasma-enhanced chemical vapour deposition, we realize catalyst-free growth of poly-crystalline two-dimensional hexagonal-boron nitride (2D-BN) with...
Paper Details
Title
Conformal hexagonal-boron nitride dielectric interface for tungsten diselenide devices with improved mobility and thermal dissipation
Published Date
Mar 13, 2019
Volume
10
Issue
1
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