Electron backscatter diffraction

Silicide

Crystallography

Crystal structure

Vickers hardness test

Tetragonal crystal system

Chemistry

Metallurgy

Materials science

Silicon

Microstructure

Journal of Materiomics

A high-entropy metal disilicide, (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2, has been successfully synthesized. X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDX), and electron backscatter diffraction (EBSD) collectively show the formation of a single high-entropy silicide phase. This high-entropy (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2 possesses a hexagonal C40 crystal structure with ABC stacking sequence and a space group of P6222. This discovery expands the known families of high-entropy materials from metals, oxides, borides, carbides, and nitrides to a silicide, for the first time to our knowledge, as well as demonstrating that a new, non-cubic, crystal structure (with lower symmetry) can be made into high-entropy phase. This (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2 exhibits high nanohardness of 16.7 ± 1.9 GPa and Vickers hardness of 11.6 ± 0.5 GPa. Moreover, it has a low thermal conductivity of 6.9 ± 1.1 W m−1 K−1, which is approximately one order of magnitude lower than that of the widely-used tetragonal MoSi2 and ∼1/3 of those reported values for the hexagonal NbSi2 and TaSi2 with the same crystal structure.

A high-entropy silicide: (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2