Role of sulphur atoms on stress relaxation and crack propagation in monolayer MoS2

Volume: 28, Issue: 36, Pages: 365703 - 365703
Published: Aug 8, 2017
Abstract
We present in-situ transmission electron microscopy of crack propagation in a freestanding monolayer MoS2 and molecular dynamic analysis of the underlying mechanisms. Chemical vapor deposited monolayer MoS2 was transferred from sapphire substrate using interfacial etching for defect and contamination minimization. Atomic resolution imaging shows crack tip atoms sustaining 14.5% strain before bond breaking, while the stress field decays at...
Paper Details
Title
Role of sulphur atoms on stress relaxation and crack propagation in monolayer MoS2
Published Date
Aug 8, 2017
Volume
28
Issue
36
Pages
365703 - 365703
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