Study on Preparation and Property of Polycrystalline Copper Nitride Thin Films

Published: Jan 1, 2005
Abstract
Copper nitride thin films were deposited on glass substrates by reactive radio-frequency (RF) magnetron sputtering at various nitrogen fluxes. X-ray diffraction shows that the nitrogen particular pressure has an important influence on the preferential orientation of the thin films. The grain size of the films estimated by Scherrer function is about 17-26 nm,the films were annealed at 200℃ in order to study the thermal stability of them and the...
Paper Details
Title
Study on Preparation and Property of Polycrystalline Copper Nitride Thin Films
Published Date
Jan 1, 2005
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