Microstructure and electrochromic mechanism of WO_3 film

Tungsten oxide films were deposited on ITO coated glass substrates by reactive DC magnetron sputtering.The electrochromic(EC) properties of the films were studied with different target-substrates distance in the deposition process.The WO3 films were characterized with X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS) and scanning electron microscopy(SEM).The electrochromic properties and mechanism were discussed by means of...