Heteroepitaxial growth of TiN thin films on Si substrates for MEMS applications
Abstract
Epitaxial TiN thin films have been deposited on Si (001) substrates for MEMS applications by laser molecular-beam epitaxy technique. The effects of film thickness on the morphology, crystal structure, residual stress distribution and electrical properties of the films have been characterized and investigated in detail. The atomic force microscopy observations showed that the surface roughness of all the samples is independent of the film...
Paper Details
Title
Heteroepitaxial growth of TiN thin films on Si substrates for MEMS applications
Published Date
Feb 1, 2016
Volume
658
Pages
862 - 866
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