Influences of in situ annealing on microstructure, residual stress and electrical resistivity for sputter-deposited Be coating

Volume: 607, Pages: 150 - 156
Published: Sep 1, 2014
Abstract
The Be coating grown on K9 substrate are fabricated at different annealing temperatures by dc magnetron sputtering, and they are composed of α-Be phase with hcp structure from XRD analysis. As the in situ annealing temperatures increase from 60 °C to 410 °C, the coating surfaces show the transition from fibrous grains dominated by surface diffusion to diamond-like grains, and then to recrystallized grains dominated by bulk diffusion. For the...
Paper Details
Title
Influences of in situ annealing on microstructure, residual stress and electrical resistivity for sputter-deposited Be coating
Published Date
Sep 1, 2014
Volume
607
Pages
150 - 156
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