Development and Active Disturbance Rejection Control of a Compliant Micro-/Nanopositioning Piezostage With Dual Mode

Volume: 61, Issue: 3, Pages: 1475 - 1492
Published: Mar 1, 2014
Abstract
In the atomic force microscope (AFM) scanning system, the piezoscanner is significant in realizing high-performance tasks. To cater to this demand, a novel compliant two-degrees-of-freedom (2-DOF) micro-/nanopositioning stage with modified lever displacement amplifiers is proposed in this paper, which can be selected to work in dual modes. Moreover, the modified double four-bar P (P denotes prismatic) joints are adopted in designing the flexible...
Paper Details
Title
Development and Active Disturbance Rejection Control of a Compliant Micro-/Nanopositioning Piezostage With Dual Mode
Published Date
Mar 1, 2014
Volume
61
Issue
3
Pages
1475 - 1492
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