Study of Ar + O2 deposition pressures on properties of pulsed laser deposited CdTe thin films at high substrate temperature

Volume: 25, Issue: 4, Pages: 1901 - 1907
Published: Feb 27, 2014
Abstract
Cadmium telluride (CdTe) thin films deposited by pulsed laser deposition (PLD) on fluorine–tin–oxide substrates under different pressures of argon (Ar) + oxygen (O2) at high substrate temperature (Ts = 500 °C) was reported in this paper. In our work, the CdTe thin films were prepared successfully at high Ts by inputting Ar + O2. As reported, PLD-CdTe thin films were almost prepared at low substrate temperatures (<300 °C) under vacuum conditions....
Paper Details
Title
Study of Ar + O2 deposition pressures on properties of pulsed laser deposited CdTe thin films at high substrate temperature
Published Date
Feb 27, 2014
Volume
25
Issue
4
Pages
1901 - 1907
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