Publisher's Note: “Morphology and chemical termination of HF-etched Si3N4 surfaces” [Appl. Phys. Lett. 105, 261603 (2014)]

Published on Jan 16, 2015in Applied Physics Letters3.597
· DOI :10.1063/1.4906341
Li Hong Liu5
Estimated H-index: 5
,
William J. I. DeBenedetti10
Estimated H-index: 10
(UTD: University of Texas at Dallas)
+ 6 AuthorsYves J. Chabal106
Estimated H-index: 106
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