Morphology and growth behavior of O2-free chemical bath deposited ZnS thin films

Volume: 593, Pages: 131 - 136
Published: Oct 30, 2015
Abstract
null null We investigate the role of reagent concentrations and ambient O2 on the morphology and growth behavior of ZnS thin films grown with the chemical bath deposition method. We investigate the role of substrate on film morphology, and find significant differences between films deposited on SiO2 versus Si. The films are also sensitive to dissolved O2 in the bath, as it causes a layer of SiO2 to form at the ZnS/Si interface during deposition....
Paper Details
Title
Morphology and growth behavior of O2-free chemical bath deposited ZnS thin films
Published Date
Oct 30, 2015
Volume
593
Pages
131 - 136
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